Publications
[38] J. Moreno, A. Khodaee, D. Okerstrom, M.P. Bradley, and L. Couëdel, “Time-resolved evolution of plasma parameters in a plasma immersion ion implantation source”, Physics of Plasmas 28, 123523 (2021). Submitted 15 July 2021, Accepted 4 December 2021, Published Online 28 December 2021. https://doi.org/10.1063/5.0063610
[37] Barrett J. Taylor and Michael P. Bradley “Characterisation of hydrogen ion implantation damage in quartz, lithium niobate and tellurium dioxide by Raman spectroscopy”, Radiation Effects and Defects in Solids, 176:7-8, 601-611 (2021). Received 24 May 2020, Accepted 12 Feb 2021, Published online: 15 Mar 2021. DOI: 10.1080/10420150.2021.1898390
[36] S.O. Kasap, J. Yang, B. Simonson, E. Adeagbo, M. Walornyj, G. Belev, M.P. Bradley, R.E. Johanson “Effects of x-ray irradiation on charge transport and charge collection efficiency in stabilized a-Se photoconductors”, J. Appl. Phys. 127, 084502 (2020)
[35] B.J. Taylor, A.E. Bourassa, M.P. Bradley , “Charged particle radiation induced changes to optical properties of acousto-optic materials”, Applied Optics 59, 3706-3713 (2020)
[34] H.A. Ejalonibu, M.P. Bradley, G. Sarty “The effect of step-wise surface nitrogen doping in MPECVD grown polycrystalline diamonds”, Materials Science and Engineering: B 258, 114559 (2020
[33] H.A. Ejalonibu, G.E. Sarty, M. P. Bradley, "Optimal Parameters for the synthesis of nitrogen vacancy (NV) centres in polycrystalline diamonds at low pressure", Journal of Materials Science: Materials in Electronics 1-14 (2019) https://doi.org/10.1007/s10854-019-01376-z
[32] M. Alaverdashvili, S. Caine, X. Li, M.J. Hackett, M.P. Bradley, H. Nichol, P.G. Paterson, "Protein Energy Malnutrition Exacerbates Stroke-Induced Forelimb Abnormalities and Dampens Neuroinflammation", Translational Stroke Research 1-9 (2018) https://doi.org/10.1007/s12975-018-0613-3
[31] M. Alaverdashvili, P.G. Paterson, M.P. Bradley, “Laser system refinements to reduce variability in infarct size in the rat photothrombotic stroke model”, Journal of Neuroscience Methods 247, pp. 58-66 (2015) doi: 10.106/j.jneumeth.2015.03.029
[30] S.K. Purdy, A.P. Knights, M.P. Bradley and G.S. Chang, “Light emitting diodes fabricated from carbon ions implanted into p-type silicon”, IEEE Trans. Elect Devices 62, pp. 914-918 (2015). DOI:10.1109/TED.2015.2395995
[29] G.R.S. Iyer, J. Wang, G. Wells, M.P. Bradley, and F. Borondics, “Nanoscale imaging of freestanding nitrogen doped single layer graphene”, Nanoscale 7, pp. 2289-2294 (2015) DOI: 10.1039/c4nr05385k
[28] G.R.S. Iyer, J Wang, G. Wells, G. Srinivasan, S. Payne, M. Bradley, and F. Borondics, “Large Area Freestanding Single Layer Graphene-Gold: A Hybrid Plasmonic Nanostructure”, ACS Nano 8 (6), pp 6353–6362 (2014). DOI: 10.1021/nn501864h
[27] E. de Mirandés, A. Zeggagh, M.P. Bradley, A. Picard and M. Stock, “Superconducting moving coil system to study the behaviour of superconducting coils for a BIPM cryogenic watt balance” Metrologia 51 S123–S131 (2014) doi:10.1088/0026-1394/51/2/S123
[26] D.S. Jessie and M.P. Bradley, “Magnetic Guiding of a Moving Ferromagnetic Sphere”, Progress In Electromagnetics Research M, 32, 245-256 (2013).doi:10.2528/PIERM1307160
[25] E. de Mirandés, A. Zeggagh, M. Bradley, A. Picard, H. Fang, A. Kiss, S. Solve, R. Chayramy and M. Stock, “Superconducting coil system to study the behavior of superconducting coils for a cryogenic watt balance”, Proc. 2012 Conference on Precision Electromagnetic Measurements (CPEM), 470-471 (2012). doi:10.1109/CPEM.2012.6251007
[24] A. Picard, M.P. Bradley, H. Fang, A. Kiss, E. de Mirandés, B. Parker, S. Solve, and M. Stock, “The BIPM Watt Balance: Improvements and Developments”, IEEE Trans. Instr. Meas. 60, 2378-2386 (2011).
[23] J.M. Maley, T.K. Sham, A. Hirose, Q. Yang, M.P. Bradley and R. Sammynaiken, “Chemical Reactions and Applications of the Reductive Surface of Porous Silicon”, J. Nanosci. Nanotechnol. 10, 6332-6339 (2010).
[22] M. Risch and M.P. Bradley, “Prospects for Band Gap Engineering by Plasma Ion Implantation”, physica status solidi (c) 6, S210-S213 (2009).
[21] M.P. Bradley, P.R. Desautels, D. Hunter, and M. Risch, “Silicon Electroluminescent Device Production via Plasma Ion Implantation”, physica status solidi (c) 6, S206-S209 (2009).
[20] P.R. Desautels, M.P. Bradley, J.T. Steenkamp, and J. Mantyka, “Electroluminescence in plasma ion implanted silicon”, phys. stat. sol. (a) 206, 985-988 (2009).
[19] M. Risch and M. Bradley, “Predicted depth profiles for nitrogen-ion implantation into gallium arsenide”, phys. stat. sol. (c) 5, 939-942 (2008).
[18] C.J.T. Steenkamp and M.P. Bradley, “Active Charge/Discharge IGBT Modulator for Marx Generator and Plasma Applications”, IEEE Trans. Plasma Sci. 35, 473-478 (2007).
[17] M.P. Bradley and C.J.T. Steenkamp, “Time-Resolved Ion and Electron Current Measurements in Pulsed Plasma Sheaths”, IEEE Trans. Plasma Sci. 34, 1156-1159 (2006).
[16] Q. Yang, W. Chen, C. Xiao, A. Hirose, and M. Bradley “Low temperature synthesis of diamond thin films through graphite etching in a microwave hydrogen plasma”, Carbon 43, 2635-2638 (2005).
[15] S. Qin, M.P. Bradley and P.L. Kellerman, “Faraday Dosimetry Characteristics of PIII Doping Processes”, IEEE Trans. Plasma Sci. 31, 369-376 (2003).
[14] S. Qin, M.P. Bradley, P.L. Kellerman, and K. Saadatmand, “Measurements of secondary electron emission and plasma density enhancement for plasma exposed surfaces using an optically isolated Faraday cup”, Rev. Sci. Inst. 73, 1153-1156 (2002).
[[3] P.L. Kellerman, V. Benveniste, M.P. Bradley, and K. Saadatmand, “Particle trapping and annihilation within the extraction system of ion sources”, Rev. Sci. Inst. 73, 834-836 (2002).
[12] P.L. Kellerman, S. Qin, M.P. Bradley, and K. Saadatmand, “Ion depletion effects in sheath dynamics during plasma immersion ion implantation- models and data”, Rev. Sci. Inst. 73, 837-839 (2002).
[11] S. Qin, M.P. Bradley, P.L. Kellerman, and K. Saadatmand, “Measurement and analysis of deposition-etch characteristics of BF3 plasma immersion ion implantation”, Rev. Sci. Inst. 73, 840-842 (2002).
[10] P.L. Kellerman, M.P. Bradley, and S. Qin, “Active Charge Control in PIII- enlarging the process space”, Surface and Coatings Technology 156, 77-82 (2002).
[9] J.D. Bernstein, P.L. Kellerman, and M.P. Bradley, “Effects of Dopant Deposition on p+/n and n+/p Shallow Junctions formed by Plasma Immersion Ion Implantation”, in Proceedings of International Conference on Ion Implantation Technology 2000 pp. 464-467 (2000).
[8] P.L. Kellerman, J.D. Bernstein, and M.P. Bradley, “Ion Energy Distributions in Plasma Immersion Ion Implantation- Theory and Experiment”, in Proceedings of International Conference on Ion Implantation Technology 2000 pp. 484-487 (2000).
[7] S. Rainville, M.P. Bradley, J.V. Porto, J.K. Thompson, and D.E. Pritchard, “Precise Measurements of the Masses of Cs, Rb and Na - A New Route to the Fine Structure Constant”, Hyperfine Interactions 132,177-187 (2001).
[6] M.P. Bradley, J.V. Porto, S. Rainville, J.K. Thompson, and D.E. Pritchard, “Penning Trap Measurements of the Masses of 133Cs, 87,85Rb, and 23Na with Uncertainties <0.2 ppb”, Phys. Rev. Lett. 83, 4510-4513 (1999).
[5] M. Bradley, F. Palmer, D. Garrison, L. Ilich, S. Rusinkiewicz, and D.E. Pritchard, “Accurate mass spectrometry of trapped ions”, Hyperfine Interactions 108, 227-238 (1997).
[4] F. DiFilippo, V. Natarajan, M. Bradley, F. Palmer, S. Rusinkiewicz, and D.E. Pritchard, “Mass Spectrometry at 0.1 Part Per Billion for Fundamental Metrology”, IEEE Trans. Instr. Meas. 44, 550-552 (1995).
[3] D.E. Pritchard and M.P. Bradley, “Atom Traps Compared with Ion Traps”, Physica Scripta T59, 131-133 (1995).
[2] F. DiFilippo, V. Natarajan, M. Bradley, F. Palmer, and D.E. Pritchard, “Accurate Atomic Mass Measurements from Penning Trap Mass Comparisons of Individual Ions”, Physica Scripta T59, 144-154 (1995).
[1] J. Henningsen, M.P. Bradley, “Line-Dependent Saturation in CO2 Lasers”, Applied Physics B-Photophysics and Laser Chemistry 56, 347-353 (1993).
[37] Barrett J. Taylor and Michael P. Bradley “Characterisation of hydrogen ion implantation damage in quartz, lithium niobate and tellurium dioxide by Raman spectroscopy”, Radiation Effects and Defects in Solids, 176:7-8, 601-611 (2021). Received 24 May 2020, Accepted 12 Feb 2021, Published online: 15 Mar 2021. DOI: 10.1080/10420150.2021.1898390
[36] S.O. Kasap, J. Yang, B. Simonson, E. Adeagbo, M. Walornyj, G. Belev, M.P. Bradley, R.E. Johanson “Effects of x-ray irradiation on charge transport and charge collection efficiency in stabilized a-Se photoconductors”, J. Appl. Phys. 127, 084502 (2020)
[35] B.J. Taylor, A.E. Bourassa, M.P. Bradley , “Charged particle radiation induced changes to optical properties of acousto-optic materials”, Applied Optics 59, 3706-3713 (2020)
[34] H.A. Ejalonibu, M.P. Bradley, G. Sarty “The effect of step-wise surface nitrogen doping in MPECVD grown polycrystalline diamonds”, Materials Science and Engineering: B 258, 114559 (2020
[33] H.A. Ejalonibu, G.E. Sarty, M. P. Bradley, "Optimal Parameters for the synthesis of nitrogen vacancy (NV) centres in polycrystalline diamonds at low pressure", Journal of Materials Science: Materials in Electronics 1-14 (2019) https://doi.org/10.1007/s10854-019-01376-z
[32] M. Alaverdashvili, S. Caine, X. Li, M.J. Hackett, M.P. Bradley, H. Nichol, P.G. Paterson, "Protein Energy Malnutrition Exacerbates Stroke-Induced Forelimb Abnormalities and Dampens Neuroinflammation", Translational Stroke Research 1-9 (2018) https://doi.org/10.1007/s12975-018-0613-3
[31] M. Alaverdashvili, P.G. Paterson, M.P. Bradley, “Laser system refinements to reduce variability in infarct size in the rat photothrombotic stroke model”, Journal of Neuroscience Methods 247, pp. 58-66 (2015) doi: 10.106/j.jneumeth.2015.03.029
[30] S.K. Purdy, A.P. Knights, M.P. Bradley and G.S. Chang, “Light emitting diodes fabricated from carbon ions implanted into p-type silicon”, IEEE Trans. Elect Devices 62, pp. 914-918 (2015). DOI:10.1109/TED.2015.2395995
[29] G.R.S. Iyer, J. Wang, G. Wells, M.P. Bradley, and F. Borondics, “Nanoscale imaging of freestanding nitrogen doped single layer graphene”, Nanoscale 7, pp. 2289-2294 (2015) DOI: 10.1039/c4nr05385k
[28] G.R.S. Iyer, J Wang, G. Wells, G. Srinivasan, S. Payne, M. Bradley, and F. Borondics, “Large Area Freestanding Single Layer Graphene-Gold: A Hybrid Plasmonic Nanostructure”, ACS Nano 8 (6), pp 6353–6362 (2014). DOI: 10.1021/nn501864h
[27] E. de Mirandés, A. Zeggagh, M.P. Bradley, A. Picard and M. Stock, “Superconducting moving coil system to study the behaviour of superconducting coils for a BIPM cryogenic watt balance” Metrologia 51 S123–S131 (2014) doi:10.1088/0026-1394/51/2/S123
[26] D.S. Jessie and M.P. Bradley, “Magnetic Guiding of a Moving Ferromagnetic Sphere”, Progress In Electromagnetics Research M, 32, 245-256 (2013).doi:10.2528/PIERM1307160
[25] E. de Mirandés, A. Zeggagh, M. Bradley, A. Picard, H. Fang, A. Kiss, S. Solve, R. Chayramy and M. Stock, “Superconducting coil system to study the behavior of superconducting coils for a cryogenic watt balance”, Proc. 2012 Conference on Precision Electromagnetic Measurements (CPEM), 470-471 (2012). doi:10.1109/CPEM.2012.6251007
[24] A. Picard, M.P. Bradley, H. Fang, A. Kiss, E. de Mirandés, B. Parker, S. Solve, and M. Stock, “The BIPM Watt Balance: Improvements and Developments”, IEEE Trans. Instr. Meas. 60, 2378-2386 (2011).
[23] J.M. Maley, T.K. Sham, A. Hirose, Q. Yang, M.P. Bradley and R. Sammynaiken, “Chemical Reactions and Applications of the Reductive Surface of Porous Silicon”, J. Nanosci. Nanotechnol. 10, 6332-6339 (2010).
[22] M. Risch and M.P. Bradley, “Prospects for Band Gap Engineering by Plasma Ion Implantation”, physica status solidi (c) 6, S210-S213 (2009).
[21] M.P. Bradley, P.R. Desautels, D. Hunter, and M. Risch, “Silicon Electroluminescent Device Production via Plasma Ion Implantation”, physica status solidi (c) 6, S206-S209 (2009).
[20] P.R. Desautels, M.P. Bradley, J.T. Steenkamp, and J. Mantyka, “Electroluminescence in plasma ion implanted silicon”, phys. stat. sol. (a) 206, 985-988 (2009).
[19] M. Risch and M. Bradley, “Predicted depth profiles for nitrogen-ion implantation into gallium arsenide”, phys. stat. sol. (c) 5, 939-942 (2008).
[18] C.J.T. Steenkamp and M.P. Bradley, “Active Charge/Discharge IGBT Modulator for Marx Generator and Plasma Applications”, IEEE Trans. Plasma Sci. 35, 473-478 (2007).
[17] M.P. Bradley and C.J.T. Steenkamp, “Time-Resolved Ion and Electron Current Measurements in Pulsed Plasma Sheaths”, IEEE Trans. Plasma Sci. 34, 1156-1159 (2006).
[16] Q. Yang, W. Chen, C. Xiao, A. Hirose, and M. Bradley “Low temperature synthesis of diamond thin films through graphite etching in a microwave hydrogen plasma”, Carbon 43, 2635-2638 (2005).
[15] S. Qin, M.P. Bradley and P.L. Kellerman, “Faraday Dosimetry Characteristics of PIII Doping Processes”, IEEE Trans. Plasma Sci. 31, 369-376 (2003).
[14] S. Qin, M.P. Bradley, P.L. Kellerman, and K. Saadatmand, “Measurements of secondary electron emission and plasma density enhancement for plasma exposed surfaces using an optically isolated Faraday cup”, Rev. Sci. Inst. 73, 1153-1156 (2002).
[[3] P.L. Kellerman, V. Benveniste, M.P. Bradley, and K. Saadatmand, “Particle trapping and annihilation within the extraction system of ion sources”, Rev. Sci. Inst. 73, 834-836 (2002).
[12] P.L. Kellerman, S. Qin, M.P. Bradley, and K. Saadatmand, “Ion depletion effects in sheath dynamics during plasma immersion ion implantation- models and data”, Rev. Sci. Inst. 73, 837-839 (2002).
[11] S. Qin, M.P. Bradley, P.L. Kellerman, and K. Saadatmand, “Measurement and analysis of deposition-etch characteristics of BF3 plasma immersion ion implantation”, Rev. Sci. Inst. 73, 840-842 (2002).
[10] P.L. Kellerman, M.P. Bradley, and S. Qin, “Active Charge Control in PIII- enlarging the process space”, Surface and Coatings Technology 156, 77-82 (2002).
[9] J.D. Bernstein, P.L. Kellerman, and M.P. Bradley, “Effects of Dopant Deposition on p+/n and n+/p Shallow Junctions formed by Plasma Immersion Ion Implantation”, in Proceedings of International Conference on Ion Implantation Technology 2000 pp. 464-467 (2000).
[8] P.L. Kellerman, J.D. Bernstein, and M.P. Bradley, “Ion Energy Distributions in Plasma Immersion Ion Implantation- Theory and Experiment”, in Proceedings of International Conference on Ion Implantation Technology 2000 pp. 484-487 (2000).
[7] S. Rainville, M.P. Bradley, J.V. Porto, J.K. Thompson, and D.E. Pritchard, “Precise Measurements of the Masses of Cs, Rb and Na - A New Route to the Fine Structure Constant”, Hyperfine Interactions 132,177-187 (2001).
[6] M.P. Bradley, J.V. Porto, S. Rainville, J.K. Thompson, and D.E. Pritchard, “Penning Trap Measurements of the Masses of 133Cs, 87,85Rb, and 23Na with Uncertainties <0.2 ppb”, Phys. Rev. Lett. 83, 4510-4513 (1999).
[5] M. Bradley, F. Palmer, D. Garrison, L. Ilich, S. Rusinkiewicz, and D.E. Pritchard, “Accurate mass spectrometry of trapped ions”, Hyperfine Interactions 108, 227-238 (1997).
[4] F. DiFilippo, V. Natarajan, M. Bradley, F. Palmer, S. Rusinkiewicz, and D.E. Pritchard, “Mass Spectrometry at 0.1 Part Per Billion for Fundamental Metrology”, IEEE Trans. Instr. Meas. 44, 550-552 (1995).
[3] D.E. Pritchard and M.P. Bradley, “Atom Traps Compared with Ion Traps”, Physica Scripta T59, 131-133 (1995).
[2] F. DiFilippo, V. Natarajan, M. Bradley, F. Palmer, and D.E. Pritchard, “Accurate Atomic Mass Measurements from Penning Trap Mass Comparisons of Individual Ions”, Physica Scripta T59, 144-154 (1995).
[1] J. Henningsen, M.P. Bradley, “Line-Dependent Saturation in CO2 Lasers”, Applied Physics B-Photophysics and Laser Chemistry 56, 347-353 (1993).